Customizing the Layout

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Using the Layout Properties Editor, customize layout properties common to all layouts and customize the appearance of a specific layout method.

  • Any changes made in the Layout Properties Editor apply only to the model currently selected.
  1. In the Data Model Explorer, click the model you want to layout using a customized layout.
  2. Choose Layout > Layout Properties Editor.
  3. Click a layout tab.
  4. Complete the changes as desired.
  5. For help on a specific option, click the option and then press F1. Contextual help for this option appears.
  6. Click OK to apply the changes and exit the editor.

The following describe options that require additional explanation:

All tabs

  • Apply: Applies your changes to all selected diagrams without closing the dialog box.
  • Defaults: Resets all values of the selected property sheet to ER/Studio Data Architect default values.
  • Layout: Applies your changes to all selected diagrams without closing the dialog box, and immediately displays any changes to the active model in the Data Model Window.
  • Reset: Resets all values of the selected property sheet to the values displayed when you opened the Layout Editor.

Disconnected tab

  • Tiling: Offers three ways of tiling disconnected entities: to grid, to rows, and to columns.
  • Tile to Grid: All disconnected entities are spaced evenly apart in a grid.
  • Tile to Rows: Maximizes space efficiency by placing connected entities in rows running left to right, leaving just enough vertical space for the tallest entity in the row.
  • Tile to Columns: Maximizes space efficiency by placing connected entities in columns running top to bottom, leaving just enough horizontal space for the widest entity in the column.

Circular tab

  • Biconnectivity: A graph is considered biconnected if within that graph, when any entity is deleted the graph remains completely connected.
  • Cluster By: The final clustering phase must be either Biconnectivity or Degree.
  • Degree: Specifies the minimum number of relationship lines that must branch off a diagram symbol before necessitating the creation of a new cluster. For example, if the data model Auto Layout Degree value is five (the default), any entity in that diagram with five or more relationship lines seeds a new cluster.

Hierarchical tab

  • Edge Routing: Specifies the nature and look of the relationship lines in the selected data model.
  • Incremental Layout: Specifies the retention of familiar component shapes in the Data Model Window. For example, if you produce a data model in one layout style, paste into the window of a data model laid out in a different style, and then join them to make a connected diagram, selecting the Incremental Layout check box preserves the different layout styles as you continue to make modifications to the data modelEdge RoutingV.
  • Layout Quality: Specifies the speed of the algorithm used to produce the layout.
  • Draft: Provides the lowest quality, but fastest level of layout.
  • Proof: Provides the highest quality, slowest level.
  • Orientation: Lets you specify one of four ways to orient the data model. Changing data model orientation does not automatically change port specifications, connectors, entity shapes, or constraints, some or all of which can rely on specific sides of entities, making for some complicated side effects of changing the orientation of complex data models. Selecting Rotation Specifications includes port specifications, connectors, entity shapes, or constraints when re-orienting the data model.
  • Undirected Layout: When a diagram is undirected, the source and target entities of any relationship are treated the same. In a directed diagram, the direction of the relationship is significant. Networks are often represented in undirected layouts, while processes are often represented in directed layouts.

Orthogonal tab

  • Compaction Quality: Specifies the quality of the process that removes unused white space in the target diagram. The primary difference between Draft, Default, and Proof quality is the number of times ER/Studio Data Architect runs a compaction algorithm on the diagram. The more often the algorithm runs, the more efficient the use of white space, and the more resource-intensive the process.
  • Edge Spacing: Specifies the horizontal and vertical distance between parallel relationship lines.
  • Incremental Layout: Specifies the retention of familiar component shapes in the Data Model Window. For example, if you produce a data model in one layout style, paste into the window of a data model laid out in a different style, and then join them to make a connected diagram, selecting the Incremental Layout check box preserves the different layout styles as you continue to make modifications to the data modelEdge RoutingV.
  • Node Spacing: Specifies the horizontal and vertical distance between entities.

Symmetric tab

  • Layout Quality: Specifies the speed of the algorithm used to produce the layout.
  • Draft: Provides the lowest quality, but fastest level of layout.
  • Proof: Provides the highest quality, slowest level.

Tree tab

  • Undirected Layout: When a diagram is undirected, the source and target entities of any relationship are treated the same. In a directed diagram, the direction of the relationship is significant. Networks are often represented in undirected layouts, while processes are often represented in directed layouts.


See Also